Sputtering Target Suppliers

Tantalum sputtering target Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W) Purity: >=99.95% or 99.99%

sputtering target/ vaporation material(ni,cr,ti,al,b,mo,nb,ta,si,ti-zr,al-si,cr-si,ni-cr-si,ti-al,sio2,etc metal and alloy target),MgF2,YF3,YbF3,CaF2,liF,SrF2,C

sputtering targets, evaporation materials, high-purity materials, alloys, coating materials, crystal foils, deposition materials, precious metals and rare earth

China rare metal material co., ltd (CRM) is an experter in manufacture sputtering targets. CRM can offers a full line of sputtering targets with various compone

fluoride: NbF3, BaF2, CeF3, MgF2, LaF3, YF3, YbF3, ErF3 etc.with high purity, no spilling, low deflation, well-distributed film, strong adhesion, better resist

Characteristic     Titanium disilicide (TiSi2) is an inorganic chemical compound.   Chemical formula：TiSi2 Molar mass：104.038 g/m

We have decades of experience designing and manufacturing vacuum systems. Our developing capability allows for multiple process systems to be built in parallel